Lam 9400se
Tīmeklis2001. gada 1. sept. · The robustness of our endpoint detection technique was tested and demonstrated under the actual physical and chemical disturbance environments of the etching process. Application of this endpoint... Tīmeklis16 등재물. LAM RESEARCH CORPORATION. 2300 EXELAN FLEX. Etchers & Ashers. 인기 품목. 11 등재물. LAM RESEARCH CORPORATION. 2300 VERSYS KIYO. Etchers & Ashers.
Lam 9400se
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http://www.gtc.tw/TLLC10131.TCP4F01%20LAM%209400.pdf Tīmeklis2002. gada 5. jūn. · Photoresist and oxide masked polysilicon samples were etched in a Lam TCP 9400SE, using both Cl 2 and HBr discharges. A three variable (inductive power/rf bias power/flow rate) fractional factorial set of experiments was performed for the photoresist and oxide masked polysilicon samples. Complete experimental sets …
TīmeklisThe Lam 9600 is intended to etch aluminum metal and TiW layers with highly vertical sidewalls suitable for 0.35 um linewidth. The plasma is a medium-high density, … http://www.ust.co/common/business/business01_4.asp
Tīmeklisduction tolerances. Because the etching process is irreversible, 10/75/90 s of breakthrough/main etch/over etch in a Lam TCP developing a highly stable etching process that can be precisely 9400SE plasma etching system. TīmeklisThe high density, low pressure RIE reactor platform for all experiments is a Lam Research TCP 9400SE. The upper chamber transformer coupled plasma (TCP) generation subsystem supplies 13.56 MHz radio frequency (rf) power through a matching network to a planar spiral coil. All experiments etch 150mm undoped poly …
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TīmeklisFig. 2 shows the cross-sectional etch profile of 0.1-m -Si gate structures after 10/75/90 s of breakthrough/main etch/over etch in a Lam TCP 9400SE plasma etching ... View in full-text Context 2 kershaw automaticTīmeklis2024. gada 11. jūn. · Patterns with geometries larger than 0.35 μm were exposed with DUV while smaller patterns were exposed with electron beam [4] . The polysilicon gate was etched using a conventional anisotropic process with HBr, Cl 2 and O 2 in a LAM 9400SE TCP reactor. After gate reoxidation, a LDD structure was defined with low … kershaw auto launch 7Tīmeklis9400SE, 9600SE : Refurbish: Alliance: 9400SE, 9400PTX, 9400DFM, 9600PTX EXELAN HPT Conversion Part's Modify SHUTTER MODIFY(300mm SEMES) SHUTTER MODIFY(300mm SEMES) 개조/개선 ESC Dechucking system(200mm LAM EXELAN/HPT) Process 진행 완료후 Sticking으로 인한 Wafer broken및 Sliding현상을 … kershaw avenuehttp://www.semistarcorp.com/product/applied-materials-amat-p5000-pecvd-etch-back/ kershaw aviationTīmeklisLAM Research TCP 9400 SE. Click Photos to Enlarge. Rainbow platform (single chamber) Cassette to cassette. Inductively coupled source (TCP®) Used for gate … kershaw be great academyTīmeklisBuy and sell used and refurbished semiconductor equipment at No.1 used semiconductor equipment marketplace SurplusGlobal, SurplusGlobal serves various semiconductor manufacturing equipment such as used Amat CVD/endura, Tel Litius, Implanter, Lam 2300, Metrology equipment, Wire Bonder, ASML Stepper, etc. kershaw automatic pocket knivesTīmeklisBrowse All LAM RESEARCH / SEZ SP203 Equipment. Browse All LAM RESEARCH / SEZ Equipment. Browse All Etchers & Ashers. Services Available for this Listing. Moov Insurance. Installation. Refurbished. Various / Other. Similar Tools. ... LAM RESEARCH TCP 9400SE. No Longer Available. kershaw baby boa knife